3M™ Diamond Pad Conditioners for CMP
3M Diamond Pad Conditioner 3M 49860-6 250207 107mm Dia
Highly engineered structured abrasive products deliver reliable performance for critical semiconductor CMP applications. 3M™ Diamond Pad Conditioners use deliberate diamond placement and protusion to produce a consistent finish, with superior diamond retention to reduce scratching. Key features and benefits: * Lower cost of ownership * Optimized for extended pad and disk life * Flat area of active diamonds for low non-uniformity * Exclusive polymer substrate enhances corrosion resistance * Diamonds secured with both chemical and mechanical bonds for superior retention
| Options | Price | Purchase |
|---|---|---|
| 3m | £9.99 |
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